using LiveCharts.Defaults; using LiveCharts.Wpf; using LiveCharts; using System; using System.Collections.Generic; using System.Collections.ObjectModel; using System.Linq; using System.Text; using System.Threading.Tasks; using InSituLaboratory.Models; namespace InSituLaboratory.ViewModels.Pages { public class DashboardViewModel : ViewModelBase { public ObservableCollection MEMSList { get; set; } = new ObservableCollection(); public ObservableCollection MEMSMassList { get; set; } = new ObservableCollection(); public DashboardViewModel() : base(null) { PageTitle = "数据中心"; IsCanClose = false; MEMSList.Add(new MEMSChromatogramModel { SamplingTime = DateTime.Now, FaultCodes = "设备温度:正常;湿度:正常", C2Concentration = "30" , C3Concentration="40" , C4Concentration ="50"}); MEMSList.Add(new MEMSChromatogramModel { SamplingTime = DateTime.Now, FaultCodes = "压力:警报、绝缘:未监控", C2Concentration = "10" , C3Concentration="20" , C4Concentration ="30"}); MEMSList.Add(new MEMSChromatogramModel { SamplingTime = DateTime.Now, FaultCodes = "设备温度:正常;湿度:正常", C2Concentration = "20" , C3Concentration="30" , C4Concentration ="70"}); MEMSList.Add(new MEMSChromatogramModel { SamplingTime = DateTime.Now, FaultCodes = "湿度:正常", C2Concentration = "15" , C3Concentration="20" , C4Concentration ="30"}); MEMSList.Add(new MEMSChromatogramModel { SamplingTime = DateTime.Now, FaultCodes = "压力:正常", C2Concentration = "15" , C3Concentration="20" , C4Concentration ="30"}); MEMSMassList.Add(new MEMSMassModel { SamplingTime = DateTime.Now, FaultCodes = "压力:正常", CH4Concentration = "10", H2OConcentration="20" , N2Concentration ="30", O2Concentration ="40", ARConcentration ="50", CO2Concentration ="60"}); } } }